Patterned polymer photonic crystals using soft lithography and holographic lithography

• Published in: Synthetic metals Vol. 148; no. 1; pp. 99 - 102
• Main Authors: Moon, Jun Hyuk, Small, Alex, Yi, Gi-Ra, Lee, Seung-Kon, Chang, Won-Seok, Pine, David J., Yang, Seung-Man
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 03.01.2005; Amsterdam Elsevier Science; New York, NY
• Subjects: Applied sciences; Exact sciences and technology; Holographic lithography; Machinery and processing; Miscellaneous; Photonic crystals; Plastics; Polymer industry, paints, wood; Scattering; Soft lithography; SU-8 photoresist; Technology of polymers; SU-8 photoresist; Soft lithography; Holographic lithography; Scattering; Photonic crystals; Photosensitivity; Epoxy resin; Experimental study; Photonic crystal; Laser beam; Manufacturing; Photolithography; Lattice structure; Photoresist
• ISSN: 0379-6779; 1879-3290
• DOI: 10.1016/j.synthmet.2004.09.019

We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.