Ultraviolet photoelectron spectroscopy of a methyl-terminated Si [formula omitted] surface

• Published in: Surface science Vol. 526; no. 1; pp. 177 - 183
• Main Authors: Miyadera, Tetsuhiko, Koma, Atsushi, Shimada, Toshihiro
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 20.02.2003
• Subjects: Alkanes; Angle resolved photoemission; Auger electron spectroscopy; Chemisorption; Electrochemical methods; Reflection high-energy electron diffraction (RHEED); Silicon; Visible and ultraviolet photoelectron spectroscopy; Chemisorption; Angle resolved photoemission; Alkanes; Auger electron spectroscopy; Electrochemical methods; Silicon; Visible and ultraviolet photoelectron spectroscopy; Reflection high-energy electron diffraction (RHEED)
• ISSN: 0039-6028; 1879-2758
• DOI: 10.1016/S0039-6028(02)02648-1

Angle-resolved ultraviolet photoelectron spectroscopy (ARUPS) of a Si(1 1 1) surface regularly terminated by methyl groups is reported. The electrochemical methylation was performed in inert atmosphere. The cleanliness and 1×1 ordering of the surface were confirmed by Auger electron spectroscopy and reflection high-energy electron diffraction, respectively. The energy band diagram has been obtained from ARUPS and each energy level was assigned from the comparison with the results of hydrogen-terminated Si(1 1 1) and quantum chemical cluster calculation.