Use of synchrotron radiation for studying multilayer nanostructures

We describe methods for using synchrotron radiation to study the metrological characteristics of multilayer nanostructures to be used as optical filters in the extreme vacuum ultraviolet range for solving nanoelectronics problems. For the synchrotron radiation metrology beamline, we have developed w...

Full description

Saved in:
Bibliographic Details
Published inMeasurement techniques Vol. 53; no. 7; pp. 772 - 777
Main Authors Zolotarevskii, Yu. M., Anevsky, S. I., Ivanov, V. S., Krutikov, V. N., Lakhov, V. M., Minaeva, O. A., Minaev, R. V.
Format Journal Article
LanguageEnglish
Published Boston Springer US 01.11.2010
Springer
Springer Nature B.V
Subjects
Accuracy
Analytical Chemistry
Characterization and Evaluation of Materials
Electronics
Electrons
Energy
Environmental monitoring
Measurement Science and Instrumentation
Measurement techniques
Metrology
Multilayers
Nanocomposites
Nanoelectronics
Nanomaterials
Nanostructure
Nanostructured materials
Nuclear radiation
Physical Chemistry
Physics
Physics and Astronomy
Plasma
Process controls
Radiation
Radiometry
Studies
Synchrotron radiation
Technology application
Ultraviolet radiation
photolithography
spectral radiance
nanoelectronics
extreme vacuum ultraviolet range
CCD arrays
synchrotron radiation
multilayer nanostructures
electron storage rings
Online AccessGet full text

Cover

More Information
Summary:We describe methods for using synchrotron radiation to study the metrological characteristics of multilayer nanostructures to be used as optical filters in the extreme vacuum ultraviolet range for solving nanoelectronics problems. For the synchrotron radiation metrology beamline, we have developed working standards for spectral irradiance and integrated irradiance.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0543-1972
1573-8906
DOI:10.1007/s11018-010-9575-x