Growth conditions and properties of tetrahedral amorphous carbon films

Tetrahedral amorphous carbon (ta-C) films have been prepared by the filtered cathodic vacuum arc (FCVA) technique. The effect of the deposition parameters (such as deposition rate, duct bias and magnetic filtering field) on the film properties (such as sp 3 fraction, optical band gap and stress) wer...

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Bibliographic Details
Published inThin solid films Vol. 308; pp. 199 - 203
Main Authors Tay, B.K, Shi, X, Cheah, L.K, Flynn, D.I
Format Journal Article
LanguageEnglish
Published Elsevier B.V 31.10.1997
Subjects
Filtered cathodic vacuum arc
Growth conditions
Tetrahedral amorphous carbon
Growth conditions
Filtered cathodic vacuum arc
Tetrahedral amorphous carbon
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Summary:Tetrahedral amorphous carbon (ta-C) films have been prepared by the filtered cathodic vacuum arc (FCVA) technique. The effect of the deposition parameters (such as deposition rate, duct bias and magnetic filtering field) on the film properties (such as sp 3 fraction, optical band gap and stress) were investigated. The film properties were determined as a function of the ion energy. A lower deposition rate is found to be more conducive to the formation of sp 3 bonding which results in a relative increase in the measured film properties. In addition, a higher optimal energy was also observed. However the change of duct bias voltage and magnetic filtering field have no effect on the sp 3 bonding and the position of the optimal energy.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(97)00430-6