Deposition dynamics of droplet-free Si nanoparticles in Ar gas using laser ablation

Droplet-free deposition of Si nanoparticle films has been studied applying time-resolved imaging of Si nanoparticles formed by laser ablation of Si targets in Ar gas. We found that Si nanoparticles can be deposited not only on substrates facing to the targets but also on substrates placed beside the...

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Bibliographic Details
Published inApplied surface science Vol. 197; pp. 674 - 678
Main Authors Takeuchi, D, Mizuta, T, Makimura, T, Yoshida, S, Fujita, M, Hata, K, Shigekawa, H, Murakami, K
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.09.2002
Subjects
Droplet-free
Pulsed laser deposition
Si nanoparticle
Time-resolved imaging
Pulsed laser deposition
Si nanoparticle
Time-resolved imaging
Droplet-free
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Summary:Droplet-free deposition of Si nanoparticle films has been studied applying time-resolved imaging of Si nanoparticles formed by laser ablation of Si targets in Ar gas. We found that Si nanoparticles can be deposited not only on substrates facing to the targets but also on substrates placed beside the target. We further confirmed using a scanning tunneling microscope (STM), Si nanoparticles with sizes of 5–8 nm are deposited on substrates placed beside the target and using a scanning electron microscope (SEM) on the substrates, no droplets are observed.
ISSN:0169-4332
1873-5584
DOI:10.1016/S0169-4332(02)00439-7