Functional patterns for thin-film-type amorphous silicon solar cells

Three types of patterns acting as light-scattering centers were constructed on bulk glass surfaces and applied to solar cell fabrication. In order to fabricate a scattering center in the transparent conducted oxide (TCO) layer, the SiO2-based solution hydrogen silsesquioxane (HSQ; Dow Corning FOx-16...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 53; no. 7; pp. 72301 - 72306
Main Authors Kim, Yang Doo, Han, Kang-Soo, Shin, Ju-Hyeon, Jang, Ji-Hoon, Lee, Jeong-Chul, Lee, Heon
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.07.2014
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Summary:Three types of patterns acting as light-scattering centers were constructed on bulk glass surfaces and applied to solar cell fabrication. In order to fabricate a scattering center in the transparent conducted oxide (TCO) layer, the SiO2-based solution hydrogen silsesquioxane (HSQ; Dow Corning FOx-16) was used for direct nano-patterning. Direct nano-patterning is a simple and fast process that exploits the solvent permeability of poly(dimethylsiloxane) (PDMS). The nano- and micro-structured SiO2 layer fabricated directs diffused light into the active layer of the solar cell, enabling effective use of this layer. This increases the external quantum efficiency and conversion efficiency of the cell. Additionally, a thinner Si junction was fabricated to ensure the effect of each pattern.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.53.072301