Sputter deposition of TiNi, TiNiPd and TiPd films displaying the two-way shape-memory effect

• Published in: Sensors and actuators. A. Physical. Vol. 53; no. 1; pp. 434 - 439
• Main Authors: Quandt, E, Halene, C, Holleck, H, Feit, K, Kohl, M, Schloβmacher, P, Skokan, A, Skrobanck, K.D
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.05.1996
• Subjects: Shape-memory effect; Smart materials; Sputter deposition; Ti(Ni,Pd) films; Ti(Ni,Pd) films; Sputter deposition; Smart materials; Shape-memory effect
• ISSN: 0924-4247; 1873-3069
• DOI: 10.1016/0924-4247(96)01147-8

TiNi, TiNiPd and TiPd films exhibiting the one-way and two-way shape-memory effect have been prepared by d.c. magnetron sputtering onto unheated substrates followed by annealing and training processes. In the case of TiNi, films could be prepared showing the R-phase transition, the important feature of which is its small hysteresis of about 1 K. By the Ni-Pd substitution the transition temperatures (austenite/martensite finish temperatures) could be increased from 32 °C/–38 °C for the binary NiTi alloy to a maximum of 570 °C/498 °C for TiPd films. The films have been subject to further microstructuring for developing micro-actuators displaying the two-way shape-memory effect.