Ellipsometric analysis and optical absorption characterization of nano-crystalline diamond film

• Published in: Transactions of Nonferrous Metals Society of China Vol. 16; no. B01; pp. 289 - 292
• Main Author: 王林军 蒋丽雯 任玲 刘健敏 苏青峰 徐闰 彭鸿雁 史伟民 夏义本
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.06.2006; Physics Department, Mudanjiang Normal College, Mudanjiang 157012, China; School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China%School of Materials Science and Engineering, Shanghai University, Shanghai 200072, China
• Subjects: chemical vapor deposition; nano-crystalline diamond film; optical absorption; 光学吸收特性; 化学汽相淀积; 椭圆偏光分析; 纳米晶金刚石膜; optical absorption; chemical vapor deposition; nano-crystalline diamond film
• ISSN: 1003-6326
• DOI: 10.1016/S1003-6326(06)60193-3

A nano-crystalline diamond （NCD） film with a smooth surface was successfully deposited on silicon by a hot filament chemical vapor deposition （HFCVD） method. Scanning electron microscopy （SEM）, atomic force microscopy （AFM）, RAMAN scattering spectra, as well as spectroscopic ellipsometry were employed to characterize the as-grown film. By fitting the spectroscopic ellipsometric data in the energy range of 0.75-1.50 eV with a three-layer model, Sildiamond＋non-diamondldiamond＋ non-diamond＋voidlair, the optical constants are obtained. The refractive index of the NCD film varies little from 2.361 to 2.366 and the extinction coefficient is of the order of 10^-2. According to the optical transmittance and absorption coefficient in the wavelength range from 200 to 1 100 nm, the optical gap of the film is estimated to be 4.3 eV by a direct optical transition mechanics.