Pixelated source mask optimization for process robustness in optical lithography

Optical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the m...

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Bibliographic Details
Published inOptics express Vol. 19; no. 20; pp. 19384 - 19398
Main Authors Jia, Ningning, Lam, Edmund Y
Format Journal Article
LanguageEnglish
Published United States 26.09.2011
Subjects
Algorithms
Computer Simulation
Lighting - methods
Manufactured Materials
Models, Theoretical
Optics and Photonics - methods
Photography
Printing
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Summary:Optical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement.
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ISSN:1094-4087
1094-4087
DOI:10.1364/OE.19.019384