Surface properties of differently prepared ultrananocrystalline diamond surfaces
Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH 4/N 2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O 3 exposure) to obtain hydrogen, oxygen, and fluorin...
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Published in | Diamond and related materials Vol. 18; no. 5; pp. 745 - 749 |
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Main Authors | , , , , , , |
Format | Journal Article Conference Proceeding |
Language | English |
Published |
Amsterdam
Elsevier B.V
01.05.2009
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Ultrananocrystalline diamond/amorphous carbon composite films have been deposited by microwave plasma chemical vapour deposition from 17% CH
4/N
2 mixtures at 600 °C. Thereafter the films were subjected to various treatments (plasma processes, UV/O
3 exposure) to obtain hydrogen, oxygen, and fluorine terminated surfaces, which then have been characterized with respect to their composition, roughness, wettability, and other properties. Among others, it will be shown that H- and F-terminated surfaces are very stable even if exposed for long time to air, while O-terminated ones are prone to contaminations. H- and O-termination can be patterned by applying the UV/O
3 treatment through a mask. Finally, it will be shown that a non-fouling poly(ethylene glycol) layer can be grafted directly on oxygen terminated surfaces by an atom transfer radical polymerization process using α-bromoisobutyryl bromide as an initiator. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/j.diamond.2009.01.005 |