A monitor for discharge cleaning using microwave spectroscopy

The measurement of the partial pressure of water is essential to monitor the conditioning during glow or ECR discharge cleaning. Usually QMF is adopted for this purpose, however, it has to be operated in better vacuum conditions of lower than 10−2 Pa and with a hot filament for the electron source....

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Bibliographic Details
Published inJournal of nuclear materials Vol. 128-129; pp. 881 - 883
Main Authors Mushiaki, Motoi, Funato, Yasuyuki, Kubota, Yusuke, Miyahara, Akira
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.12.1984
Subjects
discharge cleaning
micro-wave spectroscopy
micro-wave spectroscopy
discharge cleaning
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Summary:The measurement of the partial pressure of water is essential to monitor the conditioning during glow or ECR discharge cleaning. Usually QMF is adopted for this purpose, however, it has to be operated in better vacuum conditions of lower than 10−2 Pa and with a hot filament for the electron source. The method described in this article is an application of the microwave spectroscopy so that measurement can be carried out with relatively high pressures of up to 100 Pa and needs no hot filament. The absorption rotational spectral line of water molecules at 22.235 GHz is used for this purpose. The spectrometer consists of a waveguide absorption cell with Stark electrode, a frequency-sweep microwave source and a phase-sensitive detector. The change in the intensity of the absorption spectrum of water could be detected during hydrogen glow discharge.
ISSN:0022-3115
1873-4820
DOI:10.1016/0022-3115(84)90475-6