Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment

In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal inc...

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Published inMicroelectronic engineering Vol. 23; no. 1; pp. 215 - 218
Main Authors Louis, E., Voorma, H.-J., Koster, N.B., Shmaenok, L., Bijkerk, F., Schlatmann, R., Verhoeven, J., Platonov, Yu.Ya, van Dorssen, G.E., Padmore, H.A.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 1994
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Summary:In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for λ = 13–14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(94)90140-6