Mechanisms and energetic of atomic processes in surface diffusion

• Published in: Physica A Vol. 357; no. 2; pp. 250 - 281
• Main Author: Tsong, Tien T.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 08.11.2005
• Subjects: Arrhenius–Einstein plot; Diffusion mechanisms; Field ion microscopy; Scanning tunneling microscopy; Single atom tips; Surface diffusion; Surface nanostructures; Scanning tunneling microscopy; Single atom tips; Surface nanostructures; Field ion microscopy; Diffusion mechanisms; Arrhenius–Einstein plot; Surface diffusion
• ISSN: 0378-4371; 1873-2119
• DOI: 10.1016/j.physa.2005.06.029

Surface diffusion is a subject of basic importance for understanding mass transport phenomena in surface and nano science. In the particle aspect of surface diffusion of single atoms and simple molecules, information of interest is the detail atomic mechanisms and the activation energy of various atomic processes, and also the binding energy of atoms at different surface sites. In the absence of an external force, atoms will perform random walk without a preferred direction. When an atom is subjected to an external force, or when a chemical potential gradient exists, it will move preferentially in the direction of the force, or in the direction of decreasing chemical potential, thus the random walk becomes directional. Using atomic resolution microscopy, it is now possible to observe random walk diffusion of atoms, molecules and atomic clusters directly as well as to study the dynamic behavior of atoms as perturbed by the electronic interactions of the surface in great detail. Here, methods of studying quantitatively the particle aspect of surface diffusion and how it affects the dynamic behavior of the surface are very briefly reviewed.