Sub-micrometer domain engineering on periodically poled lithium niobate

We report a novel method to realize high-aspect ratio (∼1000) of submicron size inverted domains in two-dimensional periodically poled lattice structure on 0.5 mm-thick lithium niobate (LiNbO 3) substrate. This is achieved by photolithographic patterning of LiNbO 3 surface with self-organized dielec...

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Bibliographic Details
Published inJournal of crystal growth Vol. 292; no. 2; pp. 328 - 331
Main Authors Peng, L.-H., Chen, Y.-H., Lin, C.-D., Lin, L.-F., Kung, A.-H.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.07.2006
Elsevier
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Summary:We report a novel method to realize high-aspect ratio (∼1000) of submicron size inverted domains in two-dimensional periodically poled lattice structure on 0.5 mm-thick lithium niobate (LiNbO 3) substrate. This is achieved by photolithographic patterning of LiNbO 3 surface with self-organized dielectric spheres, followed by pulsed-field poling with liquid electrodes. The realization of submicron domain structures on electrically poled LiNbO 3 is ascribed to a local modification of the polarization switching field due to the dielectric- and structure-induced discontinuity at the boundary between the photoresist opening and self-organized dielectric spheres.
Bibliography:SourceType-Scholarly Journals-2
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ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2006.04.029