Orientation selection in functional oxide thin films

Mechanisms for orientation selection in complex oxide thin films are discussed, focusing on two examples: (1) development of a preferential texture in sol-gel prepared polycrystalline PZT films on Pt electrode layers and (2) selection of oxides for epitaxial growth on Si (111) and (100). In sol-gel...

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Published inJournal of the European Ceramic Society Vol. 24; no. 6; pp. 969 - 974
Main Authors Norga, G.J., Fé, L., Vasiliu, F., Fompeyrine, J., Locquet, J.-P., Van der Biest, O.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Oxford Elsevier Ltd 2004
Elsevier
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Summary:Mechanisms for orientation selection in complex oxide thin films are discussed, focusing on two examples: (1) development of a preferential texture in sol-gel prepared polycrystalline PZT films on Pt electrode layers and (2) selection of oxides for epitaxial growth on Si (111) and (100). In sol-gel PZT, a direct link was found between the formation of a well crystallized transient fluorite phase, promoted by reducing pyrolysis conditions, and the emergence of a strongly preferred (111) texture after crystallization. Meanwhile, in the MBE growth of epitaxial oxides on silicon, matching of silicon and oxide surface lattices is not a sufficient condition to achieve layer-by-layer growth, needed for planar films. In fact, for planar growth on Si(111), fluorite-structure compounds are required, while rocksalt and perovskite structure oxides are suited for the growth of low-roughness films on Si(100). These examples illustrate the important role played by surface energy in orientation selection.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0955-2219
1873-619X
DOI:10.1016/S0955-2219(03)00405-9