Growth of carbon nanotubes using microwave plasma-enhanced chemical vapor deposition process

Carbon nanotubes were grown on Si substrates using a plasma enhanced chemical vapor deposition technique under various gaseous compositions, microwave powers, and pressures. An iron-containing compound was used as the catalyst. The hydrocarbon used was methane. The resulting carbon nanotubes were ex...

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Bibliographic Details
Published inMaterials chemistry and physics Vol. 82; no. 3; pp. 571 - 574
Main Authors Liu, Ruo-Mei, Ting, Jyh-Ming
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 20.12.2003
Elsevier
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Summary:Carbon nanotubes were grown on Si substrates using a plasma enhanced chemical vapor deposition technique under various gaseous compositions, microwave powers, and pressures. An iron-containing compound was used as the catalyst. The hydrocarbon used was methane. The resulting carbon nanotubes were examined using scanning electron microscopy and transmission electron microscopy. The diameters of carbon nanotubes (CNTs) were found to be dominated by methane concentration and plasma power. It was also found that the catalyst particles were deformed during the growth of CNTs which led to a sheath growth mechanism.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0254-0584
1879-3312
DOI:10.1016/S0254-0584(03)00314-6