Influence of the substrate position angle on the adhesion of ZnO thin films deposited on polyimide foil substrates
▶ The substrate position angle influences the ion flux in CVAD. ▶ The ion flux obviously influences the adhesion of ZnO films on polyimide substrates. ▶ The substrate position angle influences the microstructure of ZnO films deposited by CVAD. ZnO thin films, as polymer protection layers against ult...
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Published in | Applied surface science Vol. 257; no. 7; pp. 2801 - 2805 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
15.01.2011
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | ▶ The substrate position angle influences the ion flux in CVAD. ▶ The ion flux obviously influences the adhesion of ZnO films on polyimide substrates. ▶ The substrate position angle influences the microstructure of ZnO films deposited by CVAD.
ZnO thin films, as polymer protection layers against ultraviolet radiation, were deposited on polyimide foil substrates using cathodic vacuum arc deposition technique. X-ray diffraction results showed that all the samples had (002) preferred orientation and the FWHM decreased as the position angle decreased. A fragmentation test was employed to investigate the influence of substrate position angle on the adhesion of ZnO thin films. It was found that the intrinsic adhesion between the ZnO film and the polyimide substrate is about 60MPa at the substrate position angle of 0°. When the position angle increases to ±60°, the value of intrinsic adhesion decreases to about 30MPa. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2010.10.064 |