Structural and magnetic properties of TM–SiO2 (TM = Fe, Co, Ni) films

TMx–(SiO2)1−x (TM=Fe, Co, Ni) thin films were prepared in a wide concentration range (0.35 ⩽x⩽1). Structure was studied with transmission electron microscopy (TEM), X-ray diffraction (XRD) and small angle X-ray scattering (SAXS). Magnetic and magnetotransport properties were investigated by means of...

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Published inJournal of magnetism and magnetic materials Vol. 262; no. 1; pp. 102 - 106
Main Authors Socolovsky, L.M, Denardin, J.C, Brandl, A.L, Knobel, M, Zhang, X.X
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.05.2003
Elsevier Science
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Summary:TMx–(SiO2)1−x (TM=Fe, Co, Ni) thin films were prepared in a wide concentration range (0.35 ⩽x⩽1). Structure was studied with transmission electron microscopy (TEM), X-ray diffraction (XRD) and small angle X-ray scattering (SAXS). Magnetic and magnetotransport properties were investigated by means of magnetization and Hall effect measurements. TEM images display nanometric spherical structures embedded in a SiO2 amorphous matrix, with typical sizes increasing from 3 to 5nm when TM volume concentration x is increased. SAXS measurements indicate a complex structure formed by nanosized objects. XRD measurements show that the structure is composed by amorphous SiO2 and TM crystallites. Slightly above the percolation threshold all samples display giant Hall effect. The observed magnetic properties are dependent on x, and display an evolution resulting from the progressive increase of the mean particle size.
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ISSN:0304-8853
DOI:10.1016/S0304-8853(03)00028-3