Micromachined SU8 negative resist for MMIC applications on low resistivity CMOS substrates

• Published in: Microelectronic engineering Vol. 67; pp. 417 - 421
• Main Authors: Elgaid, Khaled, McCloy, David A., Thayne, Iain G.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.06.2003; Elsevier Science
• Subjects: Applied sciences; Circuit properties; CPW lines on low resistivity silicon; Design. Technologies. Operation analysis. Testing; Electric, optical and optoelectronic circuits; Electronics; Exact sciences and technology; Integrated circuits; Integrated optics. Optical fibers and wave guides; Microelectronic fabrication (materials and surfaces technology); Micromachined CPW on Si; Microwave circuits, microwave integrated circuits, microwave transmission lines, submillimeter wave circuits; Optical and optoelectronic circuits; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; SU8 Negative resist; SU8 Negative resist; CPW lines on low resistivity silicon; Micromachined CPW on Si; Interfacial layer; Performance evaluation; Dielectric materials; Micromachine; Negative resist; Microelectronic fabrication; s parameter; Complementary MOS technology; Coplanar waveguides; MMIC
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/S0167-9317(03)00188-6

In this work we report a novel method of fabricating low loss coplanar waveguides (CPW) on CMOS grade low resistivity silicon (2Ω-cm) substrates using a micro-machined SU8 negative resist as a dielectric interface layer. S parameter measurements up 110 GHz and electromagnetic analysis was used to determine the performance of the CPW on the SU8 dielectric interface layer. An attenuation of less than 0.6 dB/mm at 60 GHz was achieved.