Substrate-temperature dependent structure and composition variations in RF magnetron sputtered titanium nitride thin films
▶ Deposition of TiN films by RF magnetron sputtering in 100% nitrogen atmosphere is demonstrated. ▶ Nitrogen stoichiometry in the films is shown to be substrate temperature dependent. ▶ Photluminescence is observed. ▶ Optical constants in the UV-visible and NIR region are reported. Using RF reactive...
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Published in | Applied surface science Vol. 257; no. 7; pp. 3069 - 3074 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
15.01.2011
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | ▶ Deposition of TiN films by RF magnetron sputtering in 100% nitrogen atmosphere is demonstrated. ▶ Nitrogen stoichiometry in the films is shown to be substrate temperature dependent. ▶ Photluminescence is observed. ▶ Optical constants in the UV-visible and NIR region are reported.
Using RF reactive magnetron sputtering process in a 100% nitrogen atmosphere, TiNx thin films were deposited on a quartz substrate. The crystal structure and optical properties of the as-deposited thin films, as a function of substrate temperature, were studied. From room temperature till 600°C, with increasing temperature, the crystal structure changed from tetragonal to cubic, with ‘x’ in TiNx increasing with the substrate temperature. In the entire temperature range x was less than 1. Simultaneously, the optical plasma band of the film shifted from the ultra-violet region having energy of 4.83eV to the visible region corresponding to energy of 2.47eV. The width of the transmittance band in the visible range varied with temperature between 460nm and 620nm. All the films exhibited a PL (photoluminescent) single band in the middle of the visible region. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2010.10.118 |