Effects of Negative Bias on the Structure of Ti Film and its Adhesiveness to the Base by Plasma

Ti film on AISI 201 was prepared by plasma. The film was characterized and analyzed by using a variety of analytical techniques, such as XRD, SEM and universal test machine. Ti films were deposited on AISI 201 stainless steel substrate, it was found that of Ti film has a different microstructure in...

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Bibliographic Details
Published inApplied Mechanics and Materials Vol. 110-116; pp. 592 - 595
Main Authors Lan, De Jun, Luo, Xue Ping, Lai, Qi, Huang, Shuang Hua, Zou, Min
Format Journal Article
LanguageEnglish
Published Zurich Trans Tech Publications Ltd 01.01.2012
Subjects
Adhesiveness
Film Density
Ti Film
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Summary:Ti film on AISI 201 was prepared by plasma. The film was characterized and analyzed by using a variety of analytical techniques, such as XRD, SEM and universal test machine. Ti films were deposited on AISI 201 stainless steel substrate, it was found that of Ti film has a different microstructure in various negative bias. And film density is connected with bias. When bias rose from the 15V to 100V, the film density increased from 3.82 g/cm3 to 4.28 g/cm3. After bias rose from the 100V to 180V, film density decreased from 4.28 g/cm3 to 4.13g/cm3. And also, due to the microstructural changes, the adhesiveness of Ti films at the AISI 201 increased from 1.16 MPa to maximum of 3.87 MPa, and then decreased. There is a similar maximum value of approximately 7.53 MPa at the AISI 304.
Bibliography:Selected, peer reviewed papers from the 2nd International Conference on Mechanical and Aerospace Engineering (ICMAE 2011), July 29-31, 2011, Bangkok, Thailand
ISBN:3037852623
9783037852620
ISSN:1660-9336
1662-7482
1662-7482
DOI:10.4028/www.scientific.net/AMM.110-116.592