Effect of monomer concentration and substrate resistance on redox behaviour of polyaniline films

• Published in: Materials chemistry and physics Vol. 48; no. 1; pp. 76 - 81
• Main Authors: Bedekar, A.G., Patil, S.F., Patil, R.C., Vijayamohanan, K.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 15.03.1997; Elsevier
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Monomer concentration; Other nonelectronic physical properties; Physical properties of thin films, nonelectronic; Physics; Polyaniline; Redox properties; Substrate resistance; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Substrate resistance; Polyaniline; Redox properties; Monomer concentration; Thin films; Cyclic voltammetry; Redox state; Electrochemical properties; Quantity ratio; Polymerization; Voltammetry; Experimental study; Monomers; Polyanilines
• ISSN: 0254-0584; 1879-3312
• DOI: 10.1016/S0254-0584(97)80082-X

The effect of monomer concentration and substrate resistance on the redox properties of polyaniline is investigated using cyclic voltammetry, The mechanism of polymerization is found to be affected drastically by the concentration of monomer while the influence of substrate resistance seems to become a predominant factor only at higher concentration. Both these parameters in combination are found to be responsible for the flattening of cyclic voltammograms due to a significant contribution of the uncompensated ohmic resistance. The extent of reversibility is observed to be a strong function of scan rate and the optimum oxidation-reduction transformation occur at a scan rate of 100 mV s −at moderate monomer concentrations. Additionally, from the optical spectra it is observed that 0.2 M monomer concentration is seen to be appropriate for obtaining selectively the conducting phase of the polymer.