Fabrication and Characterization of an FeBNdNb Magnetic Metallic Glass Thin Film

We have fabricated an Fe 67.46 B 22.5 Nd 6.3 Nb 3.74 magnetic metallic glass thin film on a (100) silicon substrate by electron cyclotron resonance ion beam sputtering. We confirmed the metallic glass state of the thin film by observing its crystallographically amorphous state using X-ray diffractom...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 51; no. 5; pp. 055803 - 055803-3
Main Authors Phan, Tuan Anh, Lee, Sangmin, Makino, Akihiro, Oguchi, Hiroyuki, Okamoto, Hiroshi, Kuwano, Hiroki
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.05.2012
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Summary:We have fabricated an Fe 67.46 B 22.5 Nd 6.3 Nb 3.74 magnetic metallic glass thin film on a (100) silicon substrate by electron cyclotron resonance ion beam sputtering. We confirmed the metallic glass state of the thin film by observing its crystallographically amorphous state using X-ray diffractometry and transmission electron microscopy, and we obtained the glass transition temperature using differential scanning calorimetry. We also confirmed the magnetization of the thin film using a physical property measurement system. The thin film showed the largest reported width of the supercooled liquid region (96 K) and the smallest reported value of coercivity (7.5 A/m) among the existing magnetic metallic glass thin films. This study is expected to lead to an increase in the variety of materials available and greater knowledge of the physical properties of magnetic metallic glass thin films and to facilitate research on developing magnetic metallic glass thin films as base materials for magnetic microelectromechanical systems.
Bibliography:AFM image of surface of the FBNN thin film. The scanned area was $1\times 1$ μm 2 . The height is indicated by the color shown by the color bar at the bottom of the figure. XRD pattern of the FBNN thin film. High-resolution TEM image of the FBNN thin film deposited on a (100) silicon substrate. The white region between the thin film and substrate is the native oxide layer of the silicon substrate. The selected-area electron diffraction (SAED) pattern is shown in the inset. DSC curve of the FBNN thin film. In-plane and out-of-plane $M$--$H$ loops of the FBNN thin film at room temperature. The in-plane $M$--$H$ loop around the origin is shown in the inset.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.51.055803