Elaboration and characterization of InAsSb grown on GaSb and GaAs substrates

We study the growth of InAs 0.91Sb 0.09 lattice matched on GaSb presenting a bandgap of 0.29 eV (4.2 μm) at 300 K. The layers are grown on (100) GaSb and GaAs substrates at atmospheric pressure in a vertical reactor MOVPE (metal organic vapor phase epitaxy) system using trimethylindium (TMIn), trime...

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Published inJournal of crystal growth Vol. 148; no. 1; pp. 25 - 30
Main Authors Giani, A., Podlecki, J., Pascal-Delannoy, F., Bougnot, G., Gouskov, L., Catinaud, C.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.02.1995
Elsevier
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Summary:We study the growth of InAs 0.91Sb 0.09 lattice matched on GaSb presenting a bandgap of 0.29 eV (4.2 μm) at 300 K. The layers are grown on (100) GaSb and GaAs substrates at atmospheric pressure in a vertical reactor MOVPE (metal organic vapor phase epitaxy) system using trimethylindium (TMIn), trimethylantimony (TMSb) and arsine (AsH 3). We report the results on growth rate and InSb incorporation versus growth parameters as temperature and TMSb partial pressure for different V III ratios. Carrier density and mobility of InAsSb undoped layers are given. Optical photoconductivity measurements are presented with a wavelength cut off up to 5.4 μm at 300 K, and the absorption by atmospheric CO 2 at 4.25 μm is clearly detected. The I- V curves of (n)InAsSb/(n and p)GaSb heterojunctions are presented. At room temperature, the dark current for the n/n heterostructure is 70 μA at −1 V, while the n/p junction is ohmic.
ISSN:0022-0248
1873-5002
DOI:10.1016/0022-0248(94)00828-0