IR laser photodeposition of a-Fe/Si films developing nanograins of ferrisilicate, iron disilicide and rare hexagonal iron upon annealing

IR laser-induced gas-phase photolysis of Fe(CO) 5 SiH 4 mixtures occurs as SiH 4 -photosensitized decomposition of Fe(CO) 5 is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid...

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Published inDalton transactions : an international journal of inorganic chemistry Vol. 41; no. 6; pp. 1727 - 1733
Main Authors Pola, J, Urbanov, M, Pokorn, D, Bakardjieva, S, ubrt, J, Bastl, Z, Gondal, M. A, Masoudi, H. M
Format Journal Article
LanguageEnglish
Published England 14.02.2012
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Summary:IR laser-induced gas-phase photolysis of Fe(CO) 5 SiH 4 mixtures occurs as SiH 4 -photosensitized decomposition of Fe(CO) 5 is accelerated by products of this decomposition and it results in deposition of amorphous Si/Fe nanocomposite films. Analyses of the deposited and subsequently annealed solid films were made by FTIR, Raman and X-ray photoelectron spectroscopy, X-ray diffraction and electron microscopy. The deposited films are amorphous, contain crystalline nanostructures of iron silicide FeSi 2 and undergo atmospheric oxidation in topmost layers to iron oxide and hydrogenated silicon oxide. Upon annealing they develop nanocrystalline structures of ferrisilicate, Fe 1.6 SiO 4 , carbon-encaged iron disilicide, FeSi 2 , and very rare hexagonal (high-pressure) Fe surviving at ambient conditions. The mechanism of formation of these nanostructures is discussed in terms of gas-phase and solid-phase reactions. Infrared laser co-photolysis of silane and iron pentacarbonyl takes place via a complex cleavage of both precursors and affords deposition of amorphous nanostructured Fe/Si composite films incorporating nanocrystalline FeSi 2 , Fe 1.6 SiO 4 and Fe.
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ISSN:1477-9226
1477-9234
DOI:10.1039/c1dt11587a