Optimisation of obliquely sputter deposited media

Obliquely sputter deposited Co x Ni 1− x thin films were prepared under varying conditions. Here the longitudinal coercivity was used to optimise the layers with respect to geometry, layer thickness, Co x Ni 1− x alloy dependence, argon pressure and input power. The coercivity was found not to scale...

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Bibliographic Details
Published inJournal of magnetism and magnetic materials Vol. 193; no. 1; pp. 352 - 356
Main Authors Bijker, M.D., Visser, E.M., Lodder, J.C., Popma, Th.J.A.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.03.1999
Elsevier Science
Subjects
Applied sciences
Electronics
Exact sciences and technology
High density recording media
Magnetic devices
Metal evaporated tape
Microstructure
Oblique media
Oblique sputter deposition
Other magnetic recording and storage devices (including tapes, disks, and drums)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
TEM
XRD
XRF
High density recording media
Metal evaporated tape
XRD
Oblique media
Microstructure
Oblique sputter deposition
TEM
XRF
Thin film device
High density
Oblique incidence
Composition effect
Evaporation
Optimization
Deposition process
Thickness
Cobalt base alloys
Magnetic tape
Manufacturing
Nickel alloy
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Summary:Obliquely sputter deposited Co x Ni 1− x thin films were prepared under varying conditions. Here the longitudinal coercivity was used to optimise the layers with respect to geometry, layer thickness, Co x Ni 1− x alloy dependence, argon pressure and input power. The coercivity was found not to scale with a simple scaling law.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0304-8853
DOI:10.1016/S0304-8853(98)00454-5