Graded gate VDMOSFET
In this work, we present a novel RF VDMOSFET with graded gate structure. It can be fabricated by regrowing gate oxide after gate patterning. This structure enables a very thin gate oxide to be used in the channel region; thus a much high transconductance can be obtained. At the gate edges, the gate...
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Published in | IEEE electron device letters Vol. 21; no. 4; pp. 176 - 178 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.04.2000
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | In this work, we present a novel RF VDMOSFET with graded gate structure. It can be fabricated by regrowing gate oxide after gate patterning. This structure enables a very thin gate oxide to be used in the channel region; thus a much high transconductance can be obtained. At the gate edges, the gate oxide thickness increases smoothly to about three times that of the channel region. This releases the electric field crowding at the gate edge, improving the breakdown voltage from 24 V to 68 V. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/55.830973 |