Diffusion behavior of sulfur in p(1×1) phase of S/Ni(1 0 0) system

• Published in: Surface science Vol. 476; no. 1; pp. 115 - 120
• Main Authors: Tsukawaki, S., Hatano, Y., Hashizume, K., Sugisaki, M.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 20.03.2001; Amsterdam Elsevier Science; New York, NY
• Subjects: Applied sciences; Condensed matter: structure, mechanical and thermal properties; Diffusion; interface formation; Exact sciences and technology; Metals. Metallurgy; Nickel; Physics; Solid surfaces and solid-solid interfaces; Sulphur; Surface diffusion; Surface structure, morphology, roughness, and topography; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Nickel; Surface diffusion; Surface structure, morphology, roughness, and topography; Sulphur; Temperature dependence; Phase diagrams; Transition elements; Adsorbed state; RHEED; Diffusion coefficient; Experimental study; Sulfur; AES; Surface structure
• ISSN: 0039-6028; 1879-2758
• DOI: 10.1016/S0039-6028(00)01130-4

The surface phase diagram of S/Ni(1 0 0) in a temperature region from room temperature to 1100 K has been examined by reflection high energy electron diffraction observation, and the temperature and sulfur coverage regions of the p(1×1) phase have been determined. The temperature dependence of surface diffusion coefficient of sulfur in the p(1×1) phase has been measured with micro-probe Auger electron spectroscopy in a temperature region from 820 to 900 K and in a sulfur coverage region from 0.03 to 0.07 ML. The obtained diffusion coefficient in the p(1×1) phase is expressed as D ( cm 2/ s)=1.0×10 −2 exp (−1.0±0.1 ( eV)/k B T).