Thermal decomposition of perfluorodecylsiloxane self-assembled monolayers in air

The thermal decomposition of perfluorodecylsiloxane self-assembled monolayers (SAMs) in air has been studied using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle analysis. It is found that the monolayers are stable in air up to about 300 °C. Above 350 °C the...

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Bibliographic Details
Published inUltramicroscopy Vol. 107; no. 10; pp. 995 - 999
Main Authors Seo, Eun K., Sung, M.M.
Format Journal Article
LanguageEnglish
Published Netherlands Elsevier B.V 01.10.2007
Subjects
Monolayer
Perfluorodecylsiloxane
Perfluorodecylsiloxane
Monolayer
018, 027
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Summary:The thermal decomposition of perfluorodecylsiloxane self-assembled monolayers (SAMs) in air has been studied using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and contact angle analysis. It is found that the monolayers are stable in air up to about 300 °C. Above 350 °C the monolayers primarily decompose through C C bond cleavage, with a gradual reduction in chain length.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0304-3991
1879-2723
DOI:10.1016/j.ultramic.2007.02.037