Dual beam depth profiling of organic materials: Variations of analysis and sputter beam conditions

• Published in: Surface and interface analysis Vol. 43; no. 1-2; pp. 198 - 200
• Main Authors: Rading, D., Moellers, R., Kollmer, F., Paul, W., Niehuis, E.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Chichester, UK John Wiley & Sons, Ltd 01.01.2011; Wiley
• Subjects: Atomic, molecular, and ion beam impact and interactions with surfaces; Beams (radiation); Bin; Buckminsterfullerene; C60; Chemical composition analysis, chemical depth and dopant profiling; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Depth profiling; dual beam mode; Electron and ion emission by liquids and solids; impact phenomena; Energy use; Exact sciences and technology; Fullerenes; Impact phenomena (including electron spectra and sputtering); Interface analysis; Irganox 1010; Irganox 3114; Materials science; Materials testing; Multilayers; organic depth profiling; Organic materials; organic multilayer sample; Physics; TOF-SIMS; organic depth profiling; Irganox 3114; C; Irganox 1010; Bi; dual beam mode; Multilayers; Depth resolution; organic multilayer sample; Fullerenes; SIMS; Depth profiles; TOF-SIMS; Organic compounds
• ISSN: 0142-2421; 1096-9918; 1096-9918
• DOI: 10.1002/sia.3422

The dual beam mode of depth profiling has been used to investigate the influence of sputter beam energy, angle and sample rotation on the quality of organic depth profiles in a TOF‐SIMS instrument. The sample under investigation was a multilayer sample consisting of Irganox 3114 embedded in a Irganox 1010 matrix provided by NPL. C60 sputter beam energies between 10 and 30 keV, and angles of 45° and 75° were used. The results are discussed with respect to depth resolution, constancy of the sputter rate and quantification possibilities. Copyright © 2010 John Wiley & Sons, Ltd.