An Expanded Cox and Strack Method for Precise Extraction of Specific Contact Resistance of Transition Metal Oxide/n-Silicon Heterojunction
Specific contact resistance <inline-formula><tex-math notation="LaTeX">(\rho _{c})</tex-math></inline-formula>, commonly extracted by Cox and Strack method (CSM) and transfer length method (TLM), is one of the most important properties of carrier-selective contacts....
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Published in | IEEE journal of photovoltaics Vol. 9; no. 4; pp. 1113 - 1120 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Piscataway
IEEE
01.07.2019
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | Specific contact resistance <inline-formula><tex-math notation="LaTeX">(\rho _{c})</tex-math></inline-formula>, commonly extracted by Cox and Strack method (CSM) and transfer length method (TLM), is one of the most important properties of carrier-selective contacts. However, in most cases, the hole-selective contacts (HSCs) deposited on n-type silicon (n-Si) substrate are Schottky heterojunction other than Ohmic contact, impeding the accurate extraction of <inline-formula><tex-math notation="LaTeX">\rho _{c}</tex-math></inline-formula> by CSM and TLM. In this paper, an expanded CSM is proposed to precisely extract the <inline-formula><tex-math notation="LaTeX">\rho _{c}</tex-math></inline-formula> of MoO x /n-Si heterojunction, achieving a generally lower coefficient of variation. The current transport characteristic and the <inline-formula><tex-math notation="LaTeX">\rho _{c}</tex-math></inline-formula> value of MoO x /n-Si heterocontact are further verified by technology computer aided design (TCAD) simulation. The results demonstrate that the expanded CSM enables a more precise <inline-formula><tex-math notation="LaTeX">\rho _{c}</tex-math></inline-formula> extraction, a better preparation technology compatibility, and a wider range of application, compared to TLM. |
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ISSN: | 2156-3381 2156-3403 |
DOI: | 10.1109/JPHOTOV.2019.2917386 |