The electronic structures for the optical absorption of Hf-O-N thin films

Issue Title: Special Issue: ICE-2005 International Conference on Electroceramics The local structures of Hf-O-N thin films were analyzed using an extended X-ray absorption fine structure (EXAFS) study on Hf L ^sub III^-edge and first-principles calculations. Depending on their composition and atomic...

Full description

Saved in:
Bibliographic Details
Published inJournal of electroceramics Vol. 17; no. 2-4; pp. 197 - 203
Main Authors SUNG KWAN KIM, KIM, Yang-Soo, JEON, Young-Ah, CHOI, Jongwan, NO, Kwang-Soo
Format Conference Proceeding Journal Article
LanguageEnglish
Published Heidelberg Springer 01.12.2006
Springer Nature B.V
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Issue Title: Special Issue: ICE-2005 International Conference on Electroceramics The local structures of Hf-O-N thin films were analyzed using an extended X-ray absorption fine structure (EXAFS) study on Hf L ^sub III^-edge and first-principles calculations. Depending on their composition and atomic configurations, Hf^sub 4^O^sub 8^ (CN: 7.0), Hf^sub 4^O^sub 5^N^sub 2^ (CN: 6.25) and Hf^sub 4^O^sub 2^N^sub 4^(CN: 5.5) were suggested as the local structures of Hf-O-N thin films. The optical band gaps of Hf-O-N thin films were compared with the calculated band gap. And to investigate the optical absorption, the effects of film compositions on the valence bands of Hf-O-N thin films were analyzed by comparing the experimental valence band with the valence band.[PUBLICATION ABSTRACT]
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1385-3449
1573-8663
DOI:10.1007/s10832-006-0469-x