Polarity dependent Al–Ti contacts to 6H–SiC
In this paper, an Al–Ti contact preparation method is described on 6H–SiC wafers. The Al and Ti were both separately deposited and co-deposited onto Si→C polarized ( 0 0 0 1 ̄ ) C and C→Si polarized (0 0 0 1) Si faces of SiC substrate by dc magnetron sputtering. The samples were annealed at 1000 °C...
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Published in | Applied surface science Vol. 233; no. 1; pp. 360 - 365 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Amsterdam
Elsevier B.V
30.06.2004
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | In this paper, an Al–Ti contact preparation method is described on 6H–SiC wafers. The Al and Ti were both separately deposited and co-deposited onto Si→C polarized (
0
0
0
1
̄
) C and C→Si polarized (0
0
0
1) Si faces of SiC substrate by dc magnetron sputtering. The samples were annealed at 1000
°C in N
2 atmosphere. The phase and morphology of the formed contacts were investigated by transmission electron microscopy. The formed contacts clearly showed polarity dependence on SiC substrate. When the SiC substrate was Si→C polarized the binary Al
3Ti phase generated. When it was C→Si polarized the ternary Ti
3SiC
2 formed along with the Al
3Ti resulting in a bilayered contact structure. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0169-4332 1873-5584 |
DOI: | 10.1016/j.apsusc.2004.03.253 |