A comprehensive analytical model for metal-insulator-semiconductor (MIS) devices: a solar cell application
As an application of the authors previous model for MIS (metal-insulator-semiconductor) devices, a detailed model for MIS solar cells has been developed that covers a wide range of parameters, including surface states, silicon dioxide thickness, substrate doping, fixed oxide charges, substrate thick...
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Published in | IEEE transactions on electron devices Vol. 40; no. 8; pp. 1446 - 1454 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
New York, NY
IEEE
01.08.1993
Institute of Electrical and Electronics Engineers |
Subjects | |
Online Access | Get full text |
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Summary: | As an application of the authors previous model for MIS (metal-insulator-semiconductor) devices, a detailed model for MIS solar cells has been developed that covers a wide range of parameters, including surface states, silicon dioxide thickness, substrate doping, fixed oxide charges, substrate thickness, and metal work function. It also takes the nonequilibrium conditions into consideration. The effects of using the actual permittivity and barrier height of thin oxide are discussed.< > |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0018-9383 0025-5408 1557-9646 1873-4227 |
DOI: | 10.1109/16.223704 |