A comprehensive analytical model for metal-insulator-semiconductor (MIS) devices: a solar cell application

As an application of the authors previous model for MIS (metal-insulator-semiconductor) devices, a detailed model for MIS solar cells has been developed that covers a wide range of parameters, including surface states, silicon dioxide thickness, substrate doping, fixed oxide charges, substrate thick...

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Bibliographic Details
Published inIEEE transactions on electron devices Vol. 40; no. 8; pp. 1446 - 1454
Main Authors Doghish, M.Y., Ho, F.D.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.08.1993
Institute of Electrical and Electronics Engineers
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Summary:As an application of the authors previous model for MIS (metal-insulator-semiconductor) devices, a detailed model for MIS solar cells has been developed that covers a wide range of parameters, including surface states, silicon dioxide thickness, substrate doping, fixed oxide charges, substrate thickness, and metal work function. It also takes the nonequilibrium conditions into consideration. The effects of using the actual permittivity and barrier height of thin oxide are discussed.< >
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9383
0025-5408
1557-9646
1873-4227
DOI:10.1109/16.223704