The study of epitaxial growth of thin Cu and Ag layers on Ag(110) and Cu(110) using total current spectroscopy, AES and work function measurement

The early stages of the growth of Cu layers deposited on Ag(110) and of Ag layers on Cu(110) have been studied by Total Current Spectroscopy, in conjunction with AES and ΔΦ measurements. The results are discussed in terms of structural properties of the substrate and the adsorbate layer. Information...

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Bibliographic Details
Published inVacuum Vol. 46; no. 2; pp. 189 - 194
Main Authors Naparty, MK, Skonieczny✠, J
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 01.02.1995
Elsevier
Subjects
Applied sciences
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Metals. Metallurgy
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Vapor phase epitaxy; growth from vapor phase
Work functions
Epitaxy
Crystal growth from vapors
Coverage rate
Experimental study
AES
Thin films
Silver
Transition elements
Growth mechanism
Heterojunctions
Copper
Vacuum deposition
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Summary:The early stages of the growth of Cu layers deposited on Ag(110) and of Ag layers on Cu(110) have been studied by Total Current Spectroscopy, in conjunction with AES and ΔΦ measurements. The results are discussed in terms of structural properties of the substrate and the adsorbate layer. Information on the growth types, lattice relaxation and inner potential are extracted from experimental data.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0042-207X
1879-2715
DOI:10.1016/0042-207X(94)E0038-Z