Combining Interference Lithography and Two-Photon Lithography for Fabricating Large-Area Photonic Crystal Structures with Controlled Defects

Interference lithography is a promising method for fabricating large-area, defect-free three-dimensional photonic crystal structures which can be used for facilitating the realization of photonic devices with a fast processing time. Although they can be used in waveguides, resonators, and detectors,...

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Published inApplied sciences Vol. 11; no. 14; p. 6559
Main Authors Jee, Hongsub, Park, Min-Joon, Jeon, Kiseok, Jeong, Chaehwan, Lee, Jaehyeong
Format Journal Article
LanguageEnglish
Published Basel MDPI AG 01.07.2021
Subjects
Arrays
Crystal defects
Crystal structure
fabrication
Glass substrates
interference lithography
Lasers
Lithography
Microscopy
Photonic crystals
Photons
polymer
Polymerization
Solar cells
two-photon lithography
Waveguides
United States > US
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Summary:Interference lithography is a promising method for fabricating large-area, defect-free three-dimensional photonic crystal structures which can be used for facilitating the realization of photonic devices with a fast processing time. Although they can be used in waveguides, resonators, and detectors, their repeated regular array patterns can only be used for limited applications. In this study, we demonstrate a method for fabricating large-area photonic crystal structures with controlled defects by combining interference lithography and two-photon lithography using a light-curable resin. By combining regular array structures and controlled patterns, monotonous but large-area regular structures can be obtained. Furthermore, the patterned structures have considerable potential for use in various applications, such as solar cells, sensors, photodetectors, micro-/nano-electronics, and cell growth.
ISSN:2076-3417
2076-3417
DOI:10.3390/app11146559