Carbon nitride film deposition by active screen plasma nitriding

Deposition of CN-based films by a novel version of active screen plasma nitriding, aiming at surface modification of polymers, is reported. The approach relies on the use of pure graphite as the grid material, which was found to act both as an active screen and as a dry source of carbon atoms for th...

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Bibliographic Details
Published inMaterials letters Vol. 65; no. 19; pp. 2985 - 2988
Main Authors Crespi, Ângela E., Maia da Costa, Marcelo E.H., Figueroa, Carlos A., Dotto, Marta E.R., Kauling, Alan P., Soares, Gabriel V., Baumvol, Israel J.R., Giacomelli, Cristiano
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.10.2011
Subjects
Active screen plasma nitriding
Carbon
Carbon nitride
Deposition
Drying
films (materials)
graphene
Graphite
Ion nitriding
polymers
Polypropylene
Screens
Surface chemistry
surfaces
Thin films
Polypropylene
Active screen plasma nitriding
Carbon nitride
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Summary:Deposition of CN-based films by a novel version of active screen plasma nitriding, aiming at surface modification of polymers, is reported. The approach relies on the use of pure graphite as the grid material, which was found to act both as an active screen and as a dry source of carbon atoms for the synthesis of thin films consisting mainly of a stoichiometric CN layer with columnar-type structure and dome-like nanostructured morphology. ► The work introduces a novel experimental arrangement for active screen plasma. ► An active screen made of pure graphite was used for the first time. ► The innovation allows to obtain carbon nitride films in an easy and cheap way.
Bibliography:http://dx.doi.org/10.1016/j.matlet.2011.06.048
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0167-577X
1873-4979
DOI:10.1016/j.matlet.2011.06.048