Thermal Plasma Sources: How Well are They Adopted to Process Needs?
Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and b...
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Published in | Plasma chemistry and plasma processing Vol. 35; no. 3; pp. 421 - 436 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Boston
Springer US
01.05.2015
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Subjects | |
Online Access | Get full text |
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Summary: | Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0272-4324 1572-8986 |
DOI: | 10.1007/s11090-015-9616-y |