尹明会, 罗. 陈. (2010). A design method for process design kit based on an SMIC 65 nm process. Journal of semiconductors, 31(10), 115-120. https://doi.org/10.1088/1674-4926/31/10/105008
Chicago Style (17th ed.) Citation尹明会, 罗海燕 陈岚. "A Design Method for Process Design Kit Based on an SMIC 65 Nm Process." Journal of Semiconductors 31, no. 10 (2010): 115-120. https://doi.org/10.1088/1674-4926/31/10/105008.
MLA (9th ed.) Citation尹明会, 罗海燕 陈岚. "A Design Method for Process Design Kit Based on an SMIC 65 Nm Process." Journal of Semiconductors, vol. 31, no. 10, 2010, pp. 115-120, https://doi.org/10.1088/1674-4926/31/10/105008.
Warning: These citations may not always be 100% accurate.