Structural, electrical and optical characteristics of Al-doped zinc oxide thin films deposited by reactive magnetron sputtering

ZnO:Al (AZO) thin films on glass were deposited by DC reactive magnetron sputtering at approximately 300°C substrate temperature. Structural, electrical and optical properties were investigated as a function of oxygen flow. XRD data shows that AZO thin films are polycrystalline with pronounced c-axi...

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Bibliographic Details
Published inIOP conference series. Materials Science and Engineering Vol. 49; no. 1; pp. 12057 - 4
Main Authors Zubkins, M, Kalendarev, R, Vilnis, K, Azens, A, Purans, J
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.01.2013
Subjects
Azo
Deposition
Grain size
Magnetron sputtering
Optical properties
Photovoltaic cells
Substrates
Thin films
Transmittance
Zinc oxide
Zinc oxides
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Summary:ZnO:Al (AZO) thin films on glass were deposited by DC reactive magnetron sputtering at approximately 300°C substrate temperature. Structural, electrical and optical properties were investigated as a function of oxygen flow. XRD data shows that AZO thin films are polycrystalline with pronounced c-axis orientation and the grain size increasing with the oxygen flow. The lowest achieved resistivity within the deposited set of samples was 7.6·10−4 Ωcm The transmittance of AZO films was above 80 % at 550 run with the optical band gap between 3.4 and 3.8 eV.
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ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/49/1/012057