Effect of in situ ultrasonic treatment on tungsten surface oxidation

• Published in: Surface science Vol. 595; no. 1; pp. 35 - 39
• Main Authors: Romanyuk, Andriy, Oelhafen, Peter, Steiner, Roland, Nellen, Philip M., Reiner, Joachim C., Melnik, Viktor
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 05.12.2005; Amsterdam Elsevier Science; New York, NY
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Crystalline–amorphous interfaces; Exact sciences and technology; Morphology; Physics; Plasma processing; Roughness; Surface structure; Topography; Tungsten oxide; Tungsten oxide; Crystalline–amorphous interfaces; Morphology; Topography; Roughness; Plasma processing; Surface structure; In situ; Surface treatments; Tungsten oxides; Amorphous state; Surface topography; Crystalline-amorphous interfaces; Transition elements; Oxidation
• ISSN: 0039-6028; 1879-2758
• DOI: 10.1016/j.susc.2005.07.035

In the present study we report on the influence of in situ ultrasonic treatment (UST) on the oxidation of tungsten surface with low-temperature oxygen plasma. We observed that in situ ultrasonic assisted oxidation leads to the substantial change of crystallinity and decreased surface roughness after oxidation. TOF-SIMS profiling and transmission electron microscopy study show significant decrease of the oxide thickness and distinctly sharper WO–W interface upon the action of acoustic vibrations. The stoichiometry of the formed films was evaluated from O1s and W4f XPS peak ratio and was found to be independent on the presence of ultrasonic treatment.