Chemisorption of tert-butanol on Si(1 0 0)

The chemisorption of tert-butanol, an important product in atomic layer deposition (ALD) of ZrO 2 from the precursor, zirconium tetra- tert-butoxide, on Si(1 0 0)−(2 × 1), has been investigated using Auger electron spectroscopy (AES) and temperature-programmed desorption (TPD). The main desorption p...

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Published inSurface science Vol. 602; no. 21; pp. 3432 - 3437
Main Authors Chen, T.-L., Yilmaz, M.B., Potapenko, D., Kou, A., Stojilovic, N., Osgood, R.M.
Format Journal Article
LanguageEnglish
Published Kidlington Elsevier B.V 01.11.2008
Elsevier
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Summary:The chemisorption of tert-butanol, an important product in atomic layer deposition (ALD) of ZrO 2 from the precursor, zirconium tetra- tert-butoxide, on Si(1 0 0)−(2 × 1), has been investigated using Auger electron spectroscopy (AES) and temperature-programmed desorption (TPD). The main desorption products of the TPD experiments are isobutene and molecular hydrogen. A comparison of TPD results obtained with a clean silicon surface with that from a hydrogen-terminated Si surface indicates no chemisorption in the latter case. AES measurements reveal the presence of carbon on the sample after TPD; the amount of carbon tracks the isobutene yield in TPD experiments. A comparison is made of observations with those expected from the known reactions of simple alcohols on Si(1 0 0)−(2 × 1) and the chemisorption attributed dominantly to O–H bond scission to yield an H and tert-butoxy-group-terminated surface.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0039-6028
1879-2758
DOI:10.1016/j.susc.2008.08.012