Platform-Dependent Properties of 193nm Single Layer Resists

A primary consideration in the design of 193nm single layer resists involves the choice of the polymer platform on which the resist is to be constructed. Two main routes (acrylics and cyclic olefins) exist for 193nm resist design. The advantages and challenges of each will be illustrated and discuss...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 11; no. 3; pp. 475 - 479
Main Authors Allen, Robert D., Wallow, Thomas I., Opitz, Juliann, Larson, Carl, DiPietro, Richard A., Sooriyakumaran, Ratnam, Brock, Philip, Breyta, Greg, Hofer, Donald C., Jayaraman, Saikumar, Vicari, Richard, Hullihen, Karen A., Rhodes, Larry F., Goodall, Brian L., Shick, Robert A.
Format Journal Article
LanguageEnglish
Published Hiratsuka The Society of Photopolymer Science and Technology(SPST) 1998
Japan Science and Technology Agency
Subjects
193nm resists
acrylics
cyclic olefins
etch resistance
polymer chemistry
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Summary:A primary consideration in the design of 193nm single layer resists involves the choice of the polymer platform on which the resist is to be constructed. Two main routes (acrylics and cyclic olefins) exist for 193nm resist design. The advantages and challenges of each will be illustrated and discussed.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.11.475