The evolution of preferred orientation and morphology of AlN films under various sputtering parameters

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Bibliographic Details
Published inJournal of crystal growth Vol. 625; p. 127439
Main Authors Wei, Zhaoxuan, Shen, Longhai, Kuang, Ye, Wang, Jian, Yang, Guoliang, Lei, Weiwei
Format Journal Article
LanguageEnglish
Published 01.01.2024
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ISSN:0022-0248
DOI:10.1016/j.jcrysgro.2023.127439