High quality Ge epitaxy on GaAs (100) grown by metal-organic chemical vapor deposition

• Published in: Thin solid films Vol. 522; pp. 340 - 344
• Main Authors: Cheng, Y.B., Chia, C.K., Chai, Y., Chi, D.Z.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.11.2012; Elsevier
• Subjects: Chemical vapor deposition; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Deposition; Diffraction; Epitaxy; Exact sciences and technology; Gallium; Gallium arsenide; Gallium arsenides; Germanium; Interdifussion; Materials science; Metal-organic chemical vapor deposition; Methods of deposition of films and coatings; film growth and epitaxy; Other semiconductors; Physics; Specific materials; Structure and morphology; thickness; Surface preparation; Surface roughness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Theory and models of film growth; Thin film structure and morphology; Germanium; Surface roughness; Interdifussion; Metal-organic chemical vapor deposition; Gallium arsenide; Surface preparation; Temperature dependence; Gallium arsenides; Gallium; Epitaxy; Roughness; Secondary ion mass spectrometry; Surface treatments; Deposition rate; XRD; MOCVD; III-V compound; Surface states; Thin films; Growth mechanism; III-V semiconductors
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2012.08.044

High quality Ge epitaxy on a GaAs (100) substrate was grown by metal-organic chemical vapor deposition using germane. The effects of growth temperature and deposition rate on the quality of the Ge epitaxy are investigated. Significant improvement in surface root-mean-square roughness is observed with increasing Ge growth temperature or deposition rate, while keeping all other deposition parameters unchanged. Investigation of the Ge material quality grown after different GaAs surface preparation conditions shows that Ga rich surfaces are beneficial for smooth Ge surfaces, which is attributed to the formation of Ge–Ga bonds at the initiation of the Ge deposition. The good crystalline quality of grown Ge film was further confirmed by high-resolution X-ray diffraction and secondary ion mass spectrometry characterization. ► The growth of high quality Ge on GaAs (100) substrate was demonstrated. ► The effects of deposition temperature and rate in the growth of Ge were investigated. ► Material quality with different surface preparation conditions was investigated. ► Surfaces with Ga rich are beneficial to ensure smoothness of the Ge epilayer.