Selective deposition contact patterning using atomic layer deposition for the fabrication of crystalline silicon solar cells

• Published in: Thin solid films Vol. 568; pp. 1 - 5
• Main Authors: Cho, Young Joon, Shin, Woong-Chul, Chang, Hyo Sik
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.10.2014; Elsevier
• Subjects: Al2O3; Aluminum oxide; Applied sciences; Atomic layer deposition; Contact; Cross-disciplinary physics: materials science; rheology; Crystal structure; Deposition; Electronics; Energy; Exact sciences and technology; Local contact patterning; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Nanoscale pattern formation; Natural energy; Passivation; Patterning; Photovoltaic cells; Photovoltaic conversion; Physics; Polymer paste; Selective deposition; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Silicon; Silicon-based solar cells; Solar cells; Solar cells. Photoelectrochemical cells; Solar energy; Vapor phase epitaxy; growth from vapor phase; Atomic layer deposition; Silicon-based solar cells; Local contact patterning; Al2O3; Passivation; Selective deposition; Polymer paste; Solar cells; Patterning; Atomic layer method; Crystal growth from vapors; Al; O; Contact printing; Silicon; Photolithography; Polymers
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2014.07.054

Selective deposition contact (SDC) patterning was applied to fabricate the rear side passivation of crystalline silicon (Si) solar cells. By this method, using screen printing for contact patterning and atomic layer deposition for the passivation of Si solar cells with Al2O3, we produced local contacts without photolithography or any laser-based processes. Passivated emitter and rear-contact solar cells passivated with ozone-based Al2O3 showed, for the SDC process, an up-to-0.7% absolute conversion-efficiency improvement. The results of this experiment indicate that the proposed method is feasible for conversion-efficiency improvement of industrial crystalline Si solar cells. •We propose a local contact formation process.•Local contact forms a screen print and an atomic layer deposited-Al2O3 film.•Ozone-based Al2O3 thin film was selectively deposited onto patterned silicon.•Selective deposition contact patterning method can increase cell-efficiency by 0.7%.