Temperature Dependence of Charge Distributions and Carrier Mobility in an Undoped Si/SiGe Heterostructure
Capacitance-voltage (<inline-formula> <tex-math notation="LaTeX">{C} </tex-math></inline-formula>-<inline-formula> <tex-math notation="LaTeX">{V} </tex-math></inline-formula>) characteristics and carrier transport properties of 2-D...
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Published in | IEEE transactions on electron devices Vol. 69; no. 2; pp. 482 - 486 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.02.2022
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | Capacitance-voltage (<inline-formula> <tex-math notation="LaTeX">{C} </tex-math></inline-formula>-<inline-formula> <tex-math notation="LaTeX">{V} </tex-math></inline-formula>) characteristics and carrier transport properties of 2-D electron gases (2DEGs) in an undoped Si/SiGe heterostructure at <inline-formula> <tex-math notation="LaTeX">{T}= {4} - {35} </tex-math></inline-formula> K are presented. Two capacitance plateaus due to density saturation of the 2DEG in the buried Si quantum well (QW) are observed and explained by a model of surface tunneling. The peak mobility at 4 K is 4.1 <inline-formula> <tex-math notation="LaTeX">\times 10^{{5}} </tex-math></inline-formula> cm 2 /<inline-formula> <tex-math notation="LaTeX">\text{V}\cdot \text{s} </tex-math></inline-formula> and enhanced by a factor of 1.97 at an even lower carrier density compared to the saturated carrier density, which is attributed to the effect of remote carrier screening. At <inline-formula> <tex-math notation="LaTeX">{T}\,\,=35 </tex-math></inline-formula> K, the mobility enhancement with a factor of 1.35 is still observed, which suggests the surface tunneling is still dominant. |
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Bibliography: | SAND-2022-0769J Taiwan Ministry of Science and Technology (MOST) NA0003525; 107-2112-M-002-014-; 110-2622-8-002-014- USDOE Office of Science (SC), Basic Energy Sciences (BES) |
ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2021.3138363 |