Multiple dip deposition of CdS films prepared by oscillating chemical bath

Highly oriented CdS thin films with thicknesses greater than 1 μm were deposited using the oscillating chemical bath deposition technique with multiple dips at 75 °C, and from 15 to 75 min as deposition times. Samples with different thicknesses were deposited by repeating the chemical deposition pro...

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Published inThin solid films Vol. 518; no. 19; pp. 5387 - 5390
Main Authors Gutiérrez-Lazos, C.D., Rosendo, E., Oliva, A.I., Ortega, M., Bartolo-Pérez, P., Juárez, H., Díaz, T., García, G., Rubín, M.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 30.07.2010
Elsevier
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Summary:Highly oriented CdS thin films with thicknesses greater than 1 μm were deposited using the oscillating chemical bath deposition technique with multiple dips at 75 °C, and from 15 to 75 min as deposition times. Samples with different thicknesses were deposited by repeating the chemical deposition process one, two and three times. All CdS films present the α-greenockite hexagonal structure with (002) as the preferential orientation. Band-gap energy values ranged from 2.35 to 2.42 eV, being the smaller value for the two dip processes. Energy dispersion spectroscopy measurements show good stoichiometry of the CdS films with 4.3 at.% as the maximum Cd variation.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2010.03.065