Fabrication and characterization of high extinction ratio transmission polarizers

• Published in: Microelectronic engineering Vol. 87; no. 5; pp. 1005 - 1007
• Main Authors: Xu, Zhen-Cheng, Xie, Shen-Qi, Shu, Zhen, Lu, Bing-Rui, Wan, Jing, Chen, Yifang, Huq, Ejaz, Qu, Xin-Ping, Liu, Ran
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.05.2010; Elsevier
• Subjects: Applied sciences; Collective excitations (including excitons, polarons, plasmons and other charge-density excitations); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Electronics; Exact sciences and technology; Extinction; Lithography; Materials science; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Nanocomposites; Nanoimprint lithography; Nanomaterials; Nanoscale pattern formation; Nanostructure; Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of bulk materials and thin films; Physics; Polarizers; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Simulation; Sub-wavelength grating; Surface and interface electron states; Surface plasmon resonance; Wavelengths; Sub-wavelength grating; Surface plasmon resonance; Nanoimprint lithography; Polarization; Stacking sequence; Nanolithography; Extinction index; Multilayers; Microelectronic fabrication; Resists; Polarizer; Stacks; Nanotechnology
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2009.11.111

In this paper, large area nanoimprint lithography on a trilayer resist stack for the nanofabrication of light polarizer was successfully carried out. Large area gratings with 10 mm × 10 mm area and 300 nm pitch were fabricated. The measurement results indicate that our polarizers exhibit extraordinarily high extinction ratio. It is observed that the extinction ratio is dependent on the wavelength. Theoretical simulation also agreed with our measured results very well. The poor reflective polarization property measured in this work was discussed.