High-Performance Junctionless MOSFETs for Ultralow-Power Analog/RF Applications

In this letter, we demonstrate the usefulness of ultralow-power (ULP) junctionless (JL) MOSFETs in achieving improved analog/RF metrics as compared to nonunderlap and underlap MOSFETs. At a drain current ( I ds ) of 10 μA/μm, JL devices achieve two times higher values of cutoff frequency ( fT ) and...

Full description

Saved in:
Bibliographic Details
Published inIEEE electron device letters Vol. 33; no. 10; pp. 1477 - 1479
Main Authors Ghosh, D., Parihar, M. S., Armstrong, G. A., Kranti, A.
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.10.2012
Institute of Electrical and Electronics Engineers
Subjects
Online AccessGet full text

Cover

Loading…
Abstract In this letter, we demonstrate the usefulness of ultralow-power (ULP) junctionless (JL) MOSFETs in achieving improved analog/RF metrics as compared to nonunderlap and underlap MOSFETs. At a drain current ( I ds ) of 10 μA/μm, JL devices achieve two times higher values of cutoff frequency ( fT ) and maximum oscillation frequency ( f MAX ) along with 65% improvement in voltage gain ( A VO ) in comparison to conventional nonunderlap MOSFETs. ULP JL devices, which do not require source/drain (S/D) profile optimization, can perform comparably to underlap devices, thereby relaxing the stringent process constraints associated with S/D profile optimization in nanoscale devices. The results highlight new opportunities for realizing future ULP analog/RF design with JL transistors.
AbstractList In this letter, we demonstrate the usefulness of ultralow-power (ULP) junctionless (JL) MOSFETs in achieving improved analog/RF metrics as compared to nonunderlap and underlap MOSFETs. At a drain current ( I ds ) of 10 μA/μm, JL devices achieve two times higher values of cutoff frequency ( fT ) and maximum oscillation frequency ( f MAX ) along with 65% improvement in voltage gain ( A VO ) in comparison to conventional nonunderlap MOSFETs. ULP JL devices, which do not require source/drain (S/D) profile optimization, can perform comparably to underlap devices, thereby relaxing the stringent process constraints associated with S/D profile optimization in nanoscale devices. The results highlight new opportunities for realizing future ULP analog/RF design with JL transistors.
Author Kranti, A.
Parihar, M. S.
Armstrong, G. A.
Ghosh, D.
Author_xml – sequence: 1
  givenname: D.
  surname: Ghosh
  fullname: Ghosh, D.
  organization: Low Power Nanoelectron. Res. Group, Indian Inst. of Technol. (IIT) Indore, Indore, India
– sequence: 2
  givenname: M. S.
  surname: Parihar
  fullname: Parihar, M. S.
  organization: Low Power Nanoelectron. Res. Group, Indian Inst. of Technol. (IIT) Indore, Indore, India
– sequence: 3
  givenname: G. A.
  surname: Armstrong
  fullname: Armstrong, G. A.
  organization: Sch. of Electron., Electr. Eng. & Comput. Sci., Queens Univ. Belfast, Belfast, UK
– sequence: 4
  givenname: A.
  surname: Kranti
  fullname: Kranti, A.
  email: akranti@iiti.ac.in
  organization: Low Power Nanoelectron. Res. Group, Indian Inst. of Technol. (IIT) Indore, Indore, India
BackLink http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26443158$$DView record in Pascal Francis
BookMark eNo9kE1PwkAQhjcGExG9m3jpxWNhZr-6PRIE0WAgKudm2e5iTWmbXQzx37sEwmkymfd5k3luSa9pG0vIA8IQEfLRYvo8pIB0SCmCYOKK9FEIlYKQrEf6kHFMGYK8Ibch_AAg5xnvk-W82n6nK-td63e6MTZ5-23Mvmqb2oaQvC8_Z9OvkMRrsq73XtftIV21B-uTcROX7ehjloy7rq6MPkLhjlw7XQd7f54Dso4Fk3m6WL68TsaL1DCR71OTARdKKaGldpktFVLUTiohQSmnrDWZwJJylFiC5BthNiBA2ojlZQmMDQiceo1vQ_DWFZ2vdtr_FQjFUUgRhRRHIcVZSESeTking9G18_HdKlw4KjlnKFTMPZ5ylbX2cpY0Z4oL9g_vMWnA
CODEN EDLEDZ
CitedBy_id crossref_primary_10_1149_2162_8777_acc35a
crossref_primary_10_1016_j_microrel_2018_10_017
crossref_primary_10_1063_1_4890845
crossref_primary_10_3938_jkps_67_1615
crossref_primary_10_1063_1_4807763
crossref_primary_10_1016_j_spmi_2017_09_049
crossref_primary_10_1016_j_physe_2019_113715
crossref_primary_10_1007_s10825_016_0826_1
crossref_primary_10_1007_s10825_016_0866_6
crossref_primary_10_1007_s11664_019_07559_y
crossref_primary_10_1007_s42341_023_00455_7
crossref_primary_10_1109_TED_2013_2247765
crossref_primary_10_1007_s00339_019_2647_0
crossref_primary_10_1109_JEDS_2016_2532965
crossref_primary_10_1007_s00542_016_3049_2
crossref_primary_10_1007_s11664_023_10260_w
crossref_primary_10_1109_TED_2017_2655541
crossref_primary_10_1007_s00542_019_04691_x
crossref_primary_10_1063_1_4971345
crossref_primary_10_1063_1_4773055
crossref_primary_10_1007_s10825_021_01808_2
crossref_primary_10_1007_s10825_013_0455_x
crossref_primary_10_1049_iet_cds_2016_0151
crossref_primary_10_1002_jnm_1985
crossref_primary_10_1016_j_micrna_2024_207924
crossref_primary_10_1016_j_spmi_2017_07_045
crossref_primary_10_1109_ACCESS_2019_2937444
crossref_primary_10_1007_s12633_021_01462_0
crossref_primary_10_1049_mnl_2017_0867
crossref_primary_10_1007_s10825_016_0798_1
crossref_primary_10_1007_s10825_021_01774_9
crossref_primary_10_1016_j_ssel_2020_12_005
crossref_primary_10_1007_s10825_017_1041_4
crossref_primary_10_1007_s11664_021_09087_0
crossref_primary_10_1016_j_aeue_2023_154714
crossref_primary_10_1016_j_spmi_2016_10_037
crossref_primary_10_1002_jnm_1938
crossref_primary_10_1007_s10825_018_1285_7
crossref_primary_10_1007_s12633_020_00904_5
crossref_primary_10_1109_TDMR_2016_2583262
crossref_primary_10_1007_s10825_020_01475_9
crossref_primary_10_1109_TED_2016_2591588
crossref_primary_10_2174_2210681209666190905124818
crossref_primary_10_1088_1361_6641_abfd16
crossref_primary_10_7567_JJAP_52_044302
crossref_primary_10_1007_s12633_020_00545_8
crossref_primary_10_1016_j_aeue_2020_153140
crossref_primary_10_1007_s11664_020_08638_1
crossref_primary_10_1007_s12633_020_00783_w
crossref_primary_10_1109_JSEN_2021_3077540
crossref_primary_10_1007_s12633_020_00609_9
crossref_primary_10_1016_j_spmi_2016_09_029
crossref_primary_10_1016_j_mseb_2020_115016
crossref_primary_10_1088_0268_1242_30_1_015002
crossref_primary_10_1007_s12633_019_00128_2
crossref_primary_10_1109_TDMR_2013_2296524
crossref_primary_10_1007_s10825_015_0769_y
crossref_primary_10_2174_2210681209666190730170031
crossref_primary_10_1088_0957_4484_26_14_145201
crossref_primary_10_1007_s42341_022_00428_2
crossref_primary_10_1016_j_spmi_2017_09_056
crossref_primary_10_1109_TED_2017_2688134
crossref_primary_10_1016_j_spmi_2015_12_024
crossref_primary_10_1109_TED_2016_2600621
crossref_primary_10_1016_j_spmi_2016_06_015
crossref_primary_10_1002_jnm_2067
crossref_primary_10_1142_S0217979219500504
crossref_primary_10_1007_s00339_019_3229_x
crossref_primary_10_1063_1_4803879
crossref_primary_10_1109_TED_2016_2581826
crossref_primary_10_1088_0268_1242_29_7_075006
crossref_primary_10_1109_TED_2013_2253324
Cites_doi 10.1109/TED.2006.871872
10.1109/ESSDERC.2010.5618216
10.1049/el.2010.2736
10.1109/LED.2006.889239
10.1016/j.sse.2003.12.014
10.1109/LED.2003.809525
10.1063/1.3079411
10.1109/TED.2011.2109724
10.1038/nnano.2010.15
10.1109/TED.2007.908596
ContentType Journal Article
Copyright 2015 INIST-CNRS
Copyright_xml – notice: 2015 INIST-CNRS
DBID 97E
RIA
RIE
IQODW
AAYXX
CITATION
DOI 10.1109/LED.2012.2210535
DatabaseName IEEE All-Society Periodicals Package (ASPP) 2005-present
IEEE All-Society Periodicals Package (ASPP) 1998-Present
IEEE Electronic Library Online
Pascal-Francis
CrossRef
DatabaseTitle CrossRef
DatabaseTitleList
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library Online
  url: https://proxy.k.utb.cz/login?url=https://ieeexplore.ieee.org/
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Applied Sciences
EISSN 1558-0563
EndPage 1479
ExternalDocumentID 10_1109_LED_2012_2210535
26443158
6293845
Genre orig-research
GroupedDBID -~X
.DC
0R~
29I
4.4
5GY
5VS
6IK
97E
AAJGR
AASAJ
ABQJQ
ABVLG
ACGFO
ACIWK
ACNCT
AENEX
AETIX
AFFNX
AI.
AIBXA
AKJIK
ALLEH
ALMA_UNASSIGNED_HOLDINGS
ATWAV
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CS3
DU5
EBS
EJD
HZ~
IBMZZ
ICLAB
IFIPE
IFJZH
IPLJI
JAVBF
LAI
M43
O9-
OCL
P2P
RIA
RIE
RIG
RNS
TAE
TN5
TWZ
VH1
XFK
08R
IQODW
AAYXX
AGSQL
CITATION
ID FETCH-LOGICAL-c359t-c70458885a6af7ed8121af6856088f8eec751d24161d064b5cb0506e7049dd033
IEDL.DBID RIE
ISSN 0741-3106
IngestDate Fri Dec 06 02:27:46 EST 2024
Sun Oct 22 16:07:24 EDT 2023
Wed Jun 26 19:20:19 EDT 2024
IsPeerReviewed true
IsScholarly true
Issue 10
Keywords Analog circuit
MOS technology
High performance
MOSFET
Circuit design
Oscillation frequency
Analog/RF
Dual gate transistor
Optimization
Nanoelectronics
Cut off frequency
Junctionless transistor
Drain current
underlap source/drain (S/D)
double-gate MOSFET
ultralow power (ULP)
Low-power electronics
Comparative study
Gain
junctionless (JL) transistor
Language English
License CC BY 4.0
https://ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c359t-c70458885a6af7ed8121af6856088f8eec751d24161d064b5cb0506e7049dd033
PageCount 3
ParticipantIDs ieee_primary_6293845
crossref_primary_10_1109_LED_2012_2210535
pascalfrancis_primary_26443158
PublicationCentury 2000
PublicationDate 2012-10-01
PublicationDateYYYYMMDD 2012-10-01
PublicationDate_xml – month: 10
  year: 2012
  text: 2012-10-01
  day: 01
PublicationDecade 2010
PublicationPlace New York, NY
PublicationPlace_xml – name: New York, NY
PublicationTitle IEEE electron device letters
PublicationTitleAbbrev LED
PublicationYear 2012
Publisher IEEE
Institute of Electrical and Electronics Engineers
Publisher_xml – name: IEEE
– name: Institute of Electrical and Electronics Engineers
References ref13
ref12
ref11
ref10
ref2
(ref9) 0
ref8
(ref1) 0
ref7
ref3
ref6
ref5
(ref4) 2006
References_xml – ident: ref10
  doi: 10.1109/TED.2006.871872
– ident: ref7
  doi: 10.1109/ESSDERC.2010.5618216
– year: 2006
  ident: ref4
  publication-title: Low capacitance FET for operation at subthreshold voltages
– ident: ref8
  doi: 10.1049/el.2010.2736
– ident: ref2
  doi: 10.1109/LED.2006.889239
– ident: ref12
  doi: 10.1016/j.sse.2003.12.014
– ident: ref13
  doi: 10.1109/LED.2003.809525
– ident: ref5
  doi: 10.1063/1.3079411
– ident: ref11
  doi: 10.1109/TED.2011.2109724
– ident: ref6
  doi: 10.1038/nnano.2010.15
– year: 0
  ident: ref9
  publication-title: Atlas User's Manual
– ident: ref3
  doi: 10.1109/TED.2007.908596
– year: 0
  ident: ref1
SSID ssj0014474
Score 2.4128175
Snippet In this letter, we demonstrate the usefulness of ultralow-power (ULP) junctionless (JL) MOSFETs in achieving improved analog/RF metrics as compared to...
SourceID crossref
pascalfrancis
ieee
SourceType Aggregation Database
Index Database
Publisher
StartPage 1477
SubjectTerms Analog circuits
Analog/RF
Applied sciences
Capacitance
Circuit properties
Cutoff frequency
double-gate MOSFET
Electric, optical and optoelectronic circuits
Electronic circuits
Electronics
Exact sciences and technology
junctionless (JL) transistor
Logic gates
Molecular electronics, nanoelectronics
MOSFETs
Performance evaluation
Radio frequency
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Transistors
ultralow power (ULP)
underlap source/drain (S/D)
Title High-Performance Junctionless MOSFETs for Ultralow-Power Analog/RF Applications
URI https://ieeexplore.ieee.org/document/6293845
Volume 33
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV3NT8IwFH8BTnrwC434QXrwYuLGPtqtPRKFECJCVBJuy9Z2HjRgZMTEv97XbQw0Hrwtad_WvNf1917fF8AVk4lC5HLx__ZCi0oWWNyXjsWUwqMwZizlJsF59BAMpnQ4Y7Ma3FS5MFrrPPhM2-Yx9-WrhVyZq7JOgNjEKatDPRRBkatVeQwoLSouI0Lid53KJemIzn3vzsRwebaH9g3LG7ttICjvqWIiIuMlMiUtullsQUx_H0brxRWRJa_2Kkts-fWrbuN_V38Ae6WuSbrF5jiEmp4fwe5WBcImjE2chzXZZA-QIQJdXvwbj0AyGj_1e89LgqNk-mYuRRaf1sQ0ViOmmsnipfPYJ90tH_gxTJHgdmCVPRYs6TORWTLMc1U5i4M4DbVCvHfjNOCoCHGecq1lyFzlGTNIofaSoGwd5gQayYRSju-fQGO-mOtTIGmCM6kKuVAulZ4WzPGElwaMaipQ02nB9Zrt0XtRSiPKTRBHRCiiyIgoKkXUgqZhYDWv5F0L2j_kVI0btc53GT_7m-4cdszbiyC8C2hkHyt9icpElrTzXfQNMWDEUA
link.rule.ids 314,780,784,796,27924,27925,54758
linkProvider IEEE
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV3NT8IwFH9BPKgHv9CIH7iDFxMH-2i37kgUgsiAKCTelq3tPGiYkRET_3pftzHQePC2pG3avNf192vfF8AV5ZFA5DLx_7ZcnXDq6Mzmhk6FwKMwpDRmKsDZHzq9Kek_0-cK3JSxMFLKzPlMNtVnZssXCV-op7KWg9jECN2ATUqQ5-bRWqXNgJA85zJiJM5slEZJw2sNOnfKi8tqWnjDoVlptxUIZVVVlE9kOEexxHk9izWQ6e6Bv1xe7lvy2lykUZN__crc-N_178NuwTa1dr49DqAiZ4ews5aDsAYj5emhj1fxA1ofoS5L_42HoOaPnrqdyVzDVm36pp5Fkk99rEqraSqfSfLSeuxq7TUr-BFMccBtTy-qLOjcpl6qczeLVmU0dMLYlQIR3wxjhyEVYixmUnKXmsJSFyGB_CVC7RrUcCQO84QwbPsYqrNkJk9AiyPsSYTLPGESbkmPGpZnxQ4lknjIdepwvRR78J4n0wiyS4jhBaiiQKkoKFRUh5oSYNmvkF0dGj_0VLYrYmeblJ3-Pe4StnoTfxAM7ocPZ7CtZspd8s6hmn4s5AVSizRqZDvqG7Ybx6M
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=High-Performance+Junctionless+MOSFETs+for+Ultralow-Power+Analog%2FRF+Applications&rft.jtitle=IEEE+electron+device+letters&rft.au=Ghosh%2C+D.&rft.au=Parihar%2C+M.+S.&rft.au=Armstrong%2C+G.+A.&rft.au=Kranti%2C+A.&rft.date=2012-10-01&rft.pub=IEEE&rft.issn=0741-3106&rft.eissn=1558-0563&rft.volume=33&rft.issue=10&rft.spage=1477&rft.epage=1479&rft_id=info:doi/10.1109%2FLED.2012.2210535&rft.externalDocID=6293845
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0741-3106&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0741-3106&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0741-3106&client=summon